Process Technology for Realization of Micromachine. LIGA Like Process Using SU-8 as Thick Photoresist.
نویسندگان
چکیده
منابع مشابه
Microfabrication of ultra-thick SU-8 photoresist for microengines
A high quality UV-lithographic process for making high aspect ratio micro reciprocating engine parts on ultra-thick SU8 photoresist CO2 is described. The research work is part of an on-going microengine research project at the University of Birmingham. The project aims to develop a compact power plant for driving MEMS devices and replacing batteries. The novelty of engine design is that the eng...
متن کاملManufacturing tolerances for UV LIGA using SU-8 resist
Abstract UV LIGA involves the exposure of SU-8 negative resist, using a UV mask aligner, to produce high aspect ratio pillars or microchannels as part of the manufacturing process for microsystems. This has been made possible by the widespread use of a UV sensitive resist SU-8. Many papers have been written on the Fresnel diffraction theory of exposure, some key properties of SU-8 and prototype...
متن کاملVolume Hologram Formation in SU-8 Photoresist
In order to further understand the mechanism of volume hologram formation in photosensitive polymers, light-induced material response is analyzed in commonly used epoxy-based negative photoresist Epon SU-8. For this purpose, time-resolved investigation of volume holographic grating growth is performed in the SU-8 based host–guest system and in the pure SU-8 material, respectively. The compariso...
متن کاملUse of SU-8 Negative Photoresist for Optical Mask Manufacturing
The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive ebeam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching . However, difficult CD ...
متن کاملDesign and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology
This paper presents the design and a new low-cost process for fabrication of a second-order micromechanical filter using UV-LIGA technology. The micromechanical filter consists of two identical bulk-mode ring resonators, mechanically coupled by a flexural-mode beam. A new lumped modeling approach is presented for the bulk-mode ring resonators and filter. The validity of the analytical derivatio...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1999
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.50.956